ऑक्साइड की पतली फिल्म में वृद्धि हेतु स्पंदित लेजर जमाव प्रणाली
The instrument can grow thin films of complex oxides using KrF excimer laser operating at 248 nm. The growth can be carried out at various combinations of pressure of oxygen in the vacuum chamber, laser repetition rate and energy as well as substrate temperature.
संपर्क व्यक्ति
- Prof. Ashish Garg
प्रवेश प्रक्रिया:
Contact Prof. Ashish Garg